Chemical modification of silicene

Wang Rong^a), Xu Ming-Sheng^b), Pi Xiao-Dong†^c)

(a) STM image of partially oxidized silicene in the 4× 4 structure, (b) STM image of the 4× 4 silicene exposed under an oxygen dose of 20 L. The arrowed line cutting across the oxygen atom represents the locations where the STS measurements are carried out, (c) the tunneling spectra (d I /d V curves) obtained along the line denoted in panel (b). The dashed lines in each STS result identify the bandgap.^{[ 46 ]}