Chemical modification of silicene
Wang Ronga) , Xu Ming-Shengb) , Pi Xiao-Dong†c) 
Chemical modification of silicene |
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Wang Rong
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| Si 2p XPS spectra of (a) pristine silicene before and after exposure to the O2 doses of 100 L and 4500 L, (b) silicene with the surface coverage of Al atoms ranging from x = 0 (pristine) to x = 0.38± 0.06, (c) silicene with the surface coverage of 0.38± 0.06 for Al atoms before and after exposure to the O2 doses of 100 L and 4500 L.[ 50 ] |
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