Chemical modification of silicene

Wang Rong^a), Xu Ming-Sheng^b), Pi Xiao-Dong†^c)

Band structures and charge density distributions of the CBM (right upper) and the VBM (right lower) states at the Γ point for silicene halogenated with (a) F, (b) Cl, (c) Br, and (d) I.^{[ 34 , 35 ]}