Plasma induced by pulsed laser and fabrication of silicon nanostructures

Hang Wei-Qi†^a), Dong Tai-Ge^b), Wang Gang^b), Liu Liu Shi-Rong^b), Huang Zhong-Mei^a), Miao Xin-Jian^a), Lv Quan^c), Qin Chao-Jian^b)

Diffraction patterns on plasmonic lattice structure under pulsed laser with different repetition rates at (a) 1 kHz, (b) 2 kHz, (c) 3 kHz, and (d) 4 kHz.