Manipulating magnetic anisotropy and ultrafast spin dynamics of magnetic nanostructures*
Cheng Zhao-Hua†, He Wei, Zhang Xiang-Qun, Sun Da-Li, Du Hai-Feng, Wu Qiong, Ye Jun, Fang Ya-Peng, Liu Hao-Liang
       
(a) Sketch map of deposition direction and the external field H ext orientation φ for MOKE measurement. (b) STM images (150 nm×150 nm) of 60° oblique incidence deposited Co film; the arrow indicates the incident atomic flux direction. (c) STM images (150 nm×150 nm) of normal incidence deposited Co film. (d) Cartesian coordinates for Co film and the UMA on Si(111) surface.[ 73 ]