Manipulating magnetic anisotropy and ultrafast spin dynamics of magnetic nanostructures |
Schematic configuration of the sample preparation and MOKE measurement, and STM images of sample surface. (a) Schematic configuration for treating substrate with controllable heating current and film preparation process. (b) Coordinate system used in the MOKE measurements and the subsequent data simulation. (c)–(f) STM images of clean surfaces on four Si(111) substrates I–IV with different widths of the terrace. The arrows indicate that the direction of the heating current changes continuously on each sample, which induces the variation of the width of the surface steps. (g), (h) STM images of 20 ML Fe films on p(2×2)/Si(111) of samples I and IV, with the corresponding small scale images in the lower right corner. Typical LEED patterns are illustrated in the insets of panels (c) and (g).[ 72 ] |