High performance trench MOS barrier Schottky diode with high- k gate oxide*
Zhai Dong-Yuana),b), Zhu Junb), Zhao Yi†a),c), Cai Yin-Feid), Shi Yib), Zheng You-Liaob)
       
Current flow lines of (a) the conventional SiO2 TMBS, (b) the conventional HfO2 TMBS, and (c) the high- k TMBS after breakdown.