Modeling the reactive sputter deposition of Ti-doped VO<sub><bold><em> x</em></bold></sub> thin films<xref ref-type="fn" rid="cpb142548fn1">*</xref>

Modeling the reactive sputter deposition of Ti-doped VO_x thin films*

Wang Tao^a), Yu He^a)†, Gu De-En^a), Guo Rui^a), Dong Xiang^a), Jiang Ya-Dong^a), Wu Rui-Lin^b)

Comparison of metal ratio varying with oxygen flow rate between the calculated results and the experimental results.