Effect of deposition parameters on structural and mechanical properties of niobium nitride synthesized by plasma focus device*
Siddiqui Jamila),b), Hussain Tousifa)†, Ahmad Riaza),b), Khalid Nidab)
       
AFM micrographs of samples exposed to 30 plasma focus shots at (a) 0°, (b) 10°, and (c) 20° angular positions at a 9-cm axial distance.