Molecular dynamic simulations of surface morphology and pulsed laser deposition growth of lithium niobate thin films on silicon substrate*
Liu Yuea), Zhu Hao-Nanb), Pei Zi-Donga), Kong Yong-Faa),c)†, Xu Jing-Juna)‡
       
The DPD simulation results for lithium niobate deposited on Si(111) surface at different temperatures: (a) 673 K, (b) 723 K, (c) 773 K, (d) 873 K, (e) 923 K.