Optimization of TiO2/Cu/TiO2 multilayers as a transparent composite electrode deposited by electron-beam evaporation at room temperature*
Sun Hong-Tao, Wang Xiao-Ping†, Kou Zhi-Qi, Wang Li-Jun, Wang Jin-Ye, Sun Yi-Qing
       
SEM micrographs of TiO2/Cu(11 nm)/TiO2 multilayer films annealed at various temperatures: (a) as-deposited, (b) 150 °C, (c) 250 °C, (d) 350 °C.