Enhanced surface plasmon interference lithography from cavity resonance in the grating slits
Guo Kai, Liu Jian-Long, Zhou Ke-Ya, Liu Shu-Tian†
Enhanced surface plasmon interference lithography from cavity resonance in the grating slits |
|
Guo Kai, Liu Jian-Long, Zhou Ke-Ya, Liu Shu-Tian†
|
| Field distributions of | H z|2 in the x – y plane for (a) L = 320 nm, w = 50 nm; (b) L = 320 nm, w = 30 nm; (c) L = 250 nm, w = 40 nm; (d) L = 290 nm, w = 40 nm. (e) Distributions along the cut line. |
| |