Enhanced surface plasmon interference lithography from cavity resonance in the grating slits
Guo Kai, Liu Jian-Long, Zhou Ke-Ya, Liu Shu-Tian†
Enhanced surface plasmon interference lithography from cavity resonance in the grating slits |
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Guo Kai, Liu Jian-Long, Zhou Ke-Ya, Liu Shu-Tian†
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| Field distributions of | H z|2 in the x – y plane under grating for (a) L = 280 nm, w = 40 nm; (b) L =280 nm, w =32 nm; (c) L = 360 nm, w = 40 nm; (d) L = 160 nm, w = 40 nm. (e) Distributions along the cut line. |
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