Modeling and experiments of N-doped vanadium oxide prepared by a reactive sputtering process
Wang Taoa) , Yu Hea)† 
, Dong Xianga) , Jiang Ya-Donga) , Wu Rui-Linb)
, Dong Xiang
Modeling and experiments of N-doped vanadium oxide prepared by a reactive sputtering process |
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Wang Tao
, Dong Xiang |
| XPS spectra for N1s core levels for film deposited at O2 flow rates of (a) 3.0 sccm, (b) 3.2 sccm, (c) 3.4 sccm, (d) 3.8 sccm, and (e) 5.0 sccm. |
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