Modeling and experiments of N-doped vanadium oxide prepared by a reactive sputtering process
Wang Taoa) , Yu Hea)† 
, Dong Xianga) , Jiang Ya-Donga) , Wu Rui-Linb)
, Dong Xiang
Modeling and experiments of N-doped vanadium oxide prepared by a reactive sputtering process |
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Wang Tao
, Dong Xiang |
| Numerical results (a) and experimental curves (b) of the target voltage as a function of the O2 flow rate at N2 flow of 0, 2, and 4 sccm. |
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