Effect of helium implantation on SiC and graphite*
Guo Hong-Yana),b)†, Ge Chang-Chuna),b)‡, Xia Minb)†§, Guo Li-Pingc), Chen Ji-Hongc), Yan Qing-Zhib)
       
TEM images of He+ implanted TEM lamella at 600°C: (a), (b) Graphite SMF-800; (c), (d) SiC.