Spin and valley filter in strain engineered silicene
Wang Sa-Ke, Wang Jun†
Spin and valley filter in strain engineered silicene |
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Wang Sa-Ke, Wang Jun†
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| Valley-resolved transmission probability T K ( K′ ) as a function of incident angle θ of the normal/strain/normal silicene system. An exchange field is applied to the strained region. Parameters are the same as those in Fig. 2 and h = 1.1 meV. |
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