Influence of substrate bias voltage on the microstructure of nc-SiO<sub><em> x</em></sub>:H film<xref ref-type="fn" rid="cpb141842fn1">*</xref>

Influence of substrate bias voltage on the microstructure of nc-SiO_x:H film*

Li Hui-Min, Yu Wei†, Xu Yan-Mei, Ji Yun, Jiang Zhao-Yi, Wang Xin-Zhan, Li Xiao-Wei‡, Fu Guang-Sheng

(a) Variation of deposition rate with bias voltage on the substrate. (b) Experimental XRD spectra each with three diffraction peaks. The inset shows the experimental and fitted diffraction peaks of S3.