Effect of twin boundary on nanoimprint process of bicrystal Al thin film studied by molecular dynamics simulation*
Xie Yue-Honga)†, Xu Jian-Ganga), Song Hai-Yangb)‡, Zhang Yun-Guanga)
       
Instantaneous defect structures of single crystal and bicrystal Al thin film with different mould displacements when the TB direction is perpendicular to the imprinting direction at 0.01 K obtained by MD simulations: (a) single crystal; the distances between the TB and the XOY plane are (b) 9.12 nm, (c) 6.31 nm, and (d) 3.51 nm.