Degradation mechanism of enhancement-mode AlGaN/GaN HEMTs using fluorine ion implantation under the on-state gate overdrive stress |
Fig. 7. Effect of electron trap filling bias V g #cod#x003D; 1.5 V, V ds #cod#x003D; 0 V on a gate overdrive stressed V g #cod#x003D; 3.0 V, V ds #cod#x003D; 1.0 V E-mode HEMT. |