Al-doping influence on crystal growth of Ni–Al alloy: Experimental testing of a theoretical model
Rong Xi-Minga), Chen Junb),c), Li Jing-Tianb),c), Zhuang Juna), Ning Xi-Jing†b),c)
       
XRD spectra of as-deposited Ni films grown with a laser energy density of 10 J/cm2 (a) and post-annealed at 833 (b), 933 (c), 1033 (d), 1133 (e), and 1233 K (f) on Si (100) substrate. The inset shows the FWHM of the Ni (111) diffraction peak as a function of annealing temperature.