Interfacial and electrical characteristics of a HfO<sub>2</sub>/n–InAlAs MOS-capacitor with different dielectric thicknesses

Interfacial and electrical characteristics of a HfO₂/n–InAlAs MOS-capacitor with different dielectric thicknesses

Guan He, Lv Hong-Liang, Guo Hui†, Zhang Yi-Men, Zhang Yu-Ming, Wu Li-Fan

Interfacial oxide performances with different t _ox values of 6 nm and 10 nm (a) interfacial XPS spectra measurements for O_1s and (b) various oxide ratios.