Fin width and height dependence of bipolar amplification in bulk FinFETs submitted to heavy ion irradiation*
Yu Jun-Tinga), Chen Shu-Minga),b), Chen Jian-Juna), Huang Peng-Chenga)
       
Schematic configuration of the p -FinFET model in simulation, which is cut in the middle of the gate along the source/drain direction.