Fin width and height dependence of bipolar amplification in bulk FinFETs submitted to heavy ion irradiation
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Yu Jun-Ting
a)
, Chen Shu-Ming
a),
b)
, Chen Jian-Jun
a)
, Huang Peng-Cheng
a)
Schematic configuration of the p -FinFET model in simulation, which is cut in the middle of the gate along the source/drain direction.