Low specific contact resistance on epitaxial p-type 4H-SiC with a step-bunching surface*
Han Chaoa), Zhang Yu-Minga), Song Qing-Wena),b), Tang Xiao-Yana), Zhang Yi-Mena), Guo Huia), Wang Yue-Hua)
       
A plan-view SEM image of the Ti/Al contact deposited on p-type epilayer grown on 8° off-axis SiC(0001) substrate after 1000 °C annealing.[ 32 ]