Low specific contact resistance on epitaxial p-type 4H-SiC with a step-bunching surface
*
Han Chao
a)
, Zhang Yu-Ming
a)
, Song Qing-Wen
a),
b)
, Tang Xiao-Yan
a)
, Zhang Yi-Men
a)
, Guo Hui
a)
, Wang Yue-Hu
a)
A plan-view SEM image of the Ti/Al contact deposited on p-type epilayer grown on 8° off-axis SiC(0001) substrate after 1000 °C annealing.
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