Low specific contact resistance on epitaxial p-type 4H-SiC with a step-bunching surface*
Han Chaoa), Zhang Yu-Minga), Song Qing-Wena),b), Tang Xiao-Yana), Zhang Yi-Mena), Guo Huia), Wang Yue-Hua)
       
XRD spectra of the Ti/Al based contacts with different stacking species after annealing at 1000 °C for 3 min.