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In situ electrical transport measurementof superconductive ultrathin films*
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Liu Can-Hua a),b), Jia Jin-Feng a),b)
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Implement of micro-4PP.[ 33 – 36 ] (a) SEM image of micro-4PP consisting of four metal-coated cantilevers that are supported on a Si chip (courtesy by S. Hasegawa). (b) SEM image of micro-4PP with tops of four cantilevers contacting a Si(111) surface (courtesy by S. Hasegawa). (c) Schematic illustration of the side view of micro-4PP contacting a sample surface. (d) Sheet resistance measured at room temperature on a ∼20-bilayer Bi(111) film grown on Si(111)-7 × 7 substrate with both measurement configurations C1423 and C1234. The measurements were performed 30 times by repeating cycles of detaching/touching probes from/to the sample surface. R s was extracted from Eq. ( 5 ). |
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