A threshold voltage model of short-channel fully-depleted recessed-source/drain (Re-S/D) SOI MOSFETs with high- k dielectric
Krishna Saramekala Gopia), Dubey Sarveshb), Kumar Tiwari Pramod†a)
       
Threshold voltages versus gate length for buried oxide thickness values. The other device parameters are the same as those in Fig.  3 .