Mechanical strains in pecvd SiN x:H films for nanophotonic application
Semenova O.†a) 
, Kozelskaya A.b) , Zhi-Yong Lic) , Yu-De Yuc)
, Kozelskaya A.
Mechanical strains in pecvd SiN x:H films for nanophotonic application |
|
Semenova O.†
, Kozelskaya A. |
| Variations of stress with temperature of SiN x :H film, deposited at 250 °C, through heating and subsequent cooling in Ar atmosphere. |
| |