Mechanical strains in pecvd SiN
x
:H films for nanophotonic application
Semenova O.†
a)
, Kozelskaya A.
b)
, Zhi-Yong Li
c)
, Yu-De Yu
c)
Variations of (a) optical density of Si–N absorption, (b) films density, and (c) Si–N peak wave number with plasma power density.