Plasmonic emission and plasma lattice structures induced by pulsed laser in Purcell cavity on silicon
Huang Wei-Qi†a), Huang Zhong-Meic), Miao Xin-Jiana), Liu Shi-Rongb), Qin Chao-Jianb)
       
(a) Plasma cavity array with Si–Yb layers (Yb film of 15 nm) on silicon by depositing an SiO2 interlayer of 6 nm, (b) plasmonic emission in the cavity under ns-pulsed Nd:YAG laser at 532 nm, and (c) plasmonic emission in the cavity under ns-pulsed Nd:YAG laser at 1064 nm.