Interfacial stress engineering toward enhancement of ferroelectricity in Al doped HfO 2 thin films
S X Chen(陈思学), M M Chen(陈明明), Y Liu(刘圆), D W Cao(曹大威), and G J Chen(陈国杰)
Interfacial stress engineering toward enhancement of ferroelectricity in Al doped HfO 2 thin films
S X Chen(陈思学), M M Chen(陈明明), Y Liu(刘圆), D W Cao(曹大威), and G J Chen(陈国杰)
中国物理B . 2024, (9): 98701 -098701 .  DOI: 10.1088/1674-1056/ad4ff4