Ferroelectricity of pristine Hf
0.5Zr
0.5O
2 films fabricated by atomic layer deposition
Luqiu Chen(陈璐秋), Xiaoxu Zhang(张晓旭), Guangdi Feng(冯光迪), Yifei Liu(刘逸飞), Shenglan Hao(郝胜兰), Qiuxiang Zhu(朱秋香), Xiaoyu Feng(冯晓钰), Ke Qu(屈可), Zhenzhong Yang(杨振中), Yuanshen Qi(祁原深), Yachin Ivry, Brahim Dkhil, Bobo Tian(田博博), Junhao Chu(褚君浩), and Chungang Duan(段纯刚)
Ferroelectricity of pristine Hf
0.5Zr
0.5O
2 films fabricated by atomic layer deposition
Luqiu Chen(陈璐秋), Xiaoxu Zhang(张晓旭), Guangdi Feng(冯光迪), Yifei Liu(刘逸飞), Shenglan Hao(郝胜兰), Qiuxiang Zhu(朱秋香), Xiaoyu Feng(冯晓钰), Ke Qu(屈可), Zhenzhong Yang(杨振中), Yuanshen Qi(祁原深), Yachin Ivry, Brahim Dkhil, Bobo Tian(田博博), Junhao Chu(褚君浩), and Chungang Duan(段纯刚)
中国物理B
.
2023, (10): 108102
-108102
.
DOI: 10.1088/1674-1056/accff3