Improved device performance of recessed-gate AlGaN/GaN HEMTs by using
in-situ N
2O radical treatment
Xinchuang Zhang(张新创), Mei Wu(武玫), Bin Hou(侯斌), Xuerui Niu(牛雪锐), Hao Lu(芦浩), Fuchun Jia(贾富春), Meng Zhang(张濛), Jiale Du(杜佳乐), Ling Yang(杨凌), Xiaohua Ma(马晓华), and Yue Hao(郝跃)
Improved device performance of recessed-gate AlGaN/GaN HEMTs by using
in-situ N
2O radical treatment
Xinchuang Zhang(张新创), Mei Wu(武玫), Bin Hou(侯斌), Xuerui Niu(牛雪锐), Hao Lu(芦浩), Fuchun Jia(贾富春), Meng Zhang(张濛), Jiale Du(杜佳乐), Ling Yang(杨凌), Xiaohua Ma(马晓华), and Yue Hao(郝跃)
中国物理B
.
2022, (5): 57301
-057301
.
DOI: 10.1088/1674-1056/ac48fb