Designing high
k dielectric films with LiPON—Al
2O
3 hybrid structure by atomic layer deposition
Ze Feng(冯泽), Yitong Wang(王一同), Jilong Hao(郝继龙), Meiyi Jing(井美艺), Feng Lu(卢峰), Weihua Wang(王维华), Yahui Cheng(程雅慧), Shengkai Wang(王盛凯), Hui Liu(刘晖), and Hong Dong(董红)
Designing high
k dielectric films with LiPON—Al
2O
3 hybrid structure by atomic layer deposition
Ze Feng(冯泽), Yitong Wang(王一同), Jilong Hao(郝继龙), Meiyi Jing(井美艺), Feng Lu(卢峰), Weihua Wang(王维华), Yahui Cheng(程雅慧), Shengkai Wang(王盛凯), Hui Liu(刘晖), and Hong Dong(董红)
中国物理B
.
2022, (5): 57701
-057701
.
DOI: 10.1088/1674-1056/ac3736