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Effect of pressure and space between electrodes on the deposition of SiN
x
H
y
films in a capacitively coupled plasma reactor
Meryem Grari, CifAllah Zoheir, Yasser Yousfi, and Abdelhak Benbrik
Effect of pressure and space between electrodes on the deposition of SiN
x
H
y
films in a capacitively coupled plasma reactor
Meryem Grari, CifAllah Zoheir, Yasser Yousfi, and Abdelhak Benbrik
中国物理B . 2021, (
5
): 55205 -055205 . DOI: 10.1088/1674-1056/abd2a4