High crystalline quality of SiGe fin fabrication with Si-rich composition area using replacement fin processing
昝颖, 李永亮, 程晓红, 赵治乾, 刘昊炎, 吴振华, 都安彦, 王文武
High crystalline quality of SiGe fin fabrication with Si-rich composition area using replacement fin processing
Ying Zan(昝颖), Yong-Liang Li(李永亮), Xiao-Hong Cheng(程晓红), Zhi-Qian Zhao(赵治乾), Hao-Yan Liu(刘昊炎), Zhen-Hua Hu(吴振华), An-Yan Du(都安彦), Wen-Wu Wang(王文武)
中国物理B
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2020, (8): 87303
-087303
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DOI: 10.1088/1674-1056/ab973e