Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging
朱静远, 张思超, 谢珊珊, 徐晨, 张丽娟, 陶旭磊, 任玉琦, 王玉丹, 邓彪, 邰仁忠, 陈宜方
Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging
Jingyuan Zhu(朱静远), Sichao Zhang(张思超), Shanshan Xie(谢珊珊), Chen Xu(徐晨), Lijuan Zhang(张丽娟), Xulei Tao(陶旭磊), Yuqi Ren(任玉琦), Yudan Wang(王玉丹), Biao Deng(邓彪), Renzhong Tai(邰仁忠), Yifang Chen(陈宜方)
中国物理B
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2020, (4): 47501
-047501
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DOI: 10.1088/1674-1056/ab7800