Water-based processed and alkoxide-based processed indium oxide thin-film transistors at different annealing temperatures
栗旭阳, 喻志农, 程锦, 陈永华, 薛建设, 郭建, 薛唯
Water-based processed and alkoxide-based processed indium oxide thin-film transistors at different annealing temperatures
Xu-Yang Li(栗旭阳), Zhi-Nong Yu(喻志农), Jin Cheng(程锦), Yong-Hua Chen(陈永华), Jian-She Xue(薛建设), Jian Guo(郭建), Wei Xue(薛唯)
中国物理B
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2018, (4): 48504
-048504
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DOI: 10.1088/1674-1056/27/4/048504