Positive gate bias stress-induced hump-effect in elevated-metal metal-oxide thin film transistors
齐栋宇, 张冬利, 王明湘
Positive gate bias stress-induced hump-effect in elevated-metal metal-oxide thin film transistors
Dong-Yu Qi(齐栋宇), Dong-Li Zhang(张冬利), Ming-Xiang Wang(王明湘)
中国物理B . 2017, (12): 128101 -128101 .  DOI: 10.1088/1674-1056/26/12/128101