Detailed study of NBTI characterization in 40-nm CMOS process using comprehensive models
曾严, 李小进, 卿健, 孙亚宾, 石艳玲, 郭奥, 胡少坚
Detailed study of NBTI characterization in 40-nm CMOS process using comprehensive models
Yan Zeng(曾严), Xiao-Jin Li(李小进), Jian Qing(卿健), Ya-Bin Sun(孙亚宾), Yan-Ling Shi(石艳玲), Ao Guo(郭奥), Shao-Jian Hu(胡少坚)
中国物理B
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2017, (10): 108503
-108503
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DOI: 10.1088/1674-1056/26/10/108503