Improvement of the high- κ/Ge interface thermal stability using an in-situ ozone treatment characterized by conductive atomic force microscopy
樊继斌, 程晓姣, 刘红侠, 王树龙, 段理
Improvement of the high- κ/Ge interface thermal stability using an in-situ ozone treatment characterized by conductive atomic force microscopy
Ji-Bin Fan(樊继斌), Xiao-Jiao Cheng(程晓姣), Hong-Xia Liu(刘红侠), Shu-Long Wang(王树龙), Li Duan(段理)
中国物理B . 2017, (8): 87701 -087701 .  DOI: 10.1088/1674-1056/26/8/087701