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Improvement of the high-
κ
/Ge interface thermal stability using an
in-situ
ozone treatment characterized by conductive atomic force microscopy
樊继斌, 程晓姣, 刘红侠, 王树龙, 段理
Improvement of the high-
κ
/Ge interface thermal stability using an
in-situ
ozone treatment characterized by conductive atomic force microscopy
Ji-Bin Fan(樊继斌), Xiao-Jiao Cheng(程晓姣), Hong-Xia Liu(刘红侠), Shu-Long Wang(王树龙), Li Duan(段理)
中国物理B . 2017, (
8
): 87701 -087701 . DOI: 10.1088/1674-1056/26/8/087701