Annealing temperature influence on the degree of inhomogeneity of the Schottky barrier in Ti/4H–SiC contacts
韩林超, 申华军, 刘可安, 王弋宇, 汤益丹, 白云, 许恒宇, 吴煜东, 刘新宇
Annealing temperature influence on the degree of inhomogeneity of the Schottky barrier in Ti/4H–SiC contacts
Han Lin-Chao (韩林超), Shen Hua-Jun (申华军), Liu Ke-An (刘可安), Wang Yi-Yu (王弋宇), Tang Yi-Dan (汤益丹), Bai Yun (白云), Xu Heng-Yu (许恒宇), Wu Yu-Dong (吴煜东), Liu Xin-Yu (刘新宇)
中国物理B
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2014, (12): 127302
-127302
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DOI: 10.1088/1674-1056/23/12/127302