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Analysis of flatband voltage shift of metal/high-
k
/SiO
2
/Si stack based on energy band alignment of entire gate stack
韩锴, 王晓磊, 徐永贵, 杨红, 王文武
Analysis of flatband voltage shift of metal/high-
k
/SiO
2
/Si stack based on energy band alignment of entire gate stack
Han Kai (韩锴), Wang Xiao-Lei (王晓磊), Xu Yong-Gui (徐永贵), Yang Hong (杨红), Wang Wen-Wu (王文武)
Chin. Phys. B . 2014, (
11
): 117702 -117702 . DOI: 10.1088/1674-1056/23/11/117702