Partial-SOI high voltage laterally double-diffused MOS with a partially buried n +-layer
胡盛东, 武星河, 朱志, 金晶晶, 陈银晖
Partial-SOI high voltage laterally double-diffused MOS with a partially buried n +-layer
Hu Sheng-Dong (胡盛东), Wu Xing-He (武星河), Zhu Zhi (朱志), Jin Jing-Jing (金晶晶), Chen Yin-Hui (陈银晖)
中国物理B . 2014, (6): 67101 -067101 .  DOI: 10.1088/1674-1056/23/6/067101