Investigation of chlorine-based etchants in wet and dry etching technology for an InP planar Gunn diode
白阳, 贾锐, 武德起, 金智, 刘新宇, 林美玉
Investigation of chlorine-based etchants in wet and dry etching technology for an InP planar Gunn diode
Bai Yang (白阳), Jia Rui (贾锐), Wu De-Qi (武德起), Jin Zhi (金智), Liu Xin-Yu (刘新宇), Lin Mei-Yu (林美玉)
中国物理B
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2013, (8): 87202
-087202
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DOI: 10.1088/1674-1056/22/8/087202