Influences of high-temperature annealing on atomic layer deposited Al
2O
3/4H-SiC
王弋宇, 申华军, 白云, 汤益丹, 刘可安, 李诚瞻, 刘新宇
Influences of high-temperature annealing on atomic layer deposited Al
2O
3/4H-SiC
Wang Yi-Yu (王弋宇), Shen Hua-Jun (申华军), Bai Yun (白云), Tang Yi-Dan (汤益丹), Liu Ke-An (刘可安), Li Cheng-Zhan (李诚瞻), Liu Xin-Yu (刘新宇)
中国物理B
.
2013, (7): 78102
-078102
.
DOI: 10.1088/1674-1056/22/7/078102