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Influences of different oxidants on the characteristics of HfAlO
x
films deposited by atomic layer deposition
樊继斌, 刘红侠, 马飞, 卓青青, 郝跃
Influences of different oxidants on the characteristics of HfAlO
x
films deposited by atomic layer deposition
Fan Ji-Bin (樊继斌), Liu Hong-Xia (刘红侠), Ma Fei (马飞), Zhuo Qing-Qing (卓青青), Hao Yue (郝跃)
Chin. Phys. B . 2013, (
2
): 27702 -027702 . DOI: 10.1088/1674-1056/22/2/027702