Influence of different oxidants on band alignment of HfO
2 films deposited by atomic layer deposition
樊继斌, 刘红侠, 高博, 马飞, 卓青青, 郝跃
Influence of different oxidants on band alignment of HfO
2 films deposited by atomic layer deposition
Fan Ji-Bin (樊继斌), Liu Hong-Xia (刘红侠), Gao Bo (高博), Ma Fei (马飞), Zhuo Qing-Qing (卓青青), Hao Yue (郝跃)
中国物理B
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2012, (8): 87702
-087702
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DOI: 10.1088/1674-1056/21/8/087702