Study of the lateral distribution of neodymium ions implanted in silicon
秦希峰, 李洪珍, 李双, 梁毅, 王凤翔, 付刚, 季艳菊
Study of the lateral distribution of neodymium ions implanted in silicon
Qin Xi-Feng(秦希峰), Li Hong-Zhen(李洪珍), Li Shuang(李双), Liang Yi(梁毅), Wang Feng-Xiang(王凤翔), Fu Gang(付刚), and Ji Yan-Ju(季艳菊)
中国物理B
.
2011, (8): 86103
-086103
.
DOI: 10.1088/1674-1056/20/8/086103