Origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid
王良咏, 刘波, 宋志棠, 刘卫丽, 封松林, 黄丕成, S.V Babu
Origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid
Wang Liang-Yong(王良咏), Liu Bo(刘波), Song Zhi-Tang(宋志棠), Liu Wei-Li(刘卫丽), Feng Song-Lin(封松林), David Huang(黄丕成), and S.V Babu
中国物理B
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2011, (3): 38102
-038102
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DOI: 10.1088/1674-1056/20/3/038102